Chemical vapor deposition (CVD) technology is the main technology used to prepare high purity, high performance solid films. In a typical CVD process, one or more vapor source atoms or molecules are mixed in a chamber, and a chemical reaction occurs under external energy (such as heating, illuminating plasma, etc.) to form a desired solid on the surface of the wafer. film. Often, many by-products are produced during the process and these by-products are carried away by the gas stream leaving the chamber. Because CVD technology has the advantages of fast growth rate, wide film formation range, good reproducibility, and epitaxial growth, it is widely used in many different forms of film formation, such as compound film, single crystal film, polycrystalline film and non- Crystalline film, and become a key technology in the field of microelectronics, optoelectronics and functional coatings.