Chemical vapor deposition (CVD) technology is the main technology for the preparation of high purity and high performance solid film. In a typical CVD process, one or more steam atoms or molecules are mixed into the chamber, and react with the external energy (such as heating, light plasma, etc.) to form chemical reactions and form solid films on the wafer surface. Usually, a lot of by-products are produced during the process, which will be taken away from the chamber by air flow. Because the CVD technology has a fast growth rate, film range, good reproducibility, can achieve epitaxial growth and other advantages, is widely used in a variety of different forms of film, such as compound film, single crystal films, polycrystalline films and amorphous films, and has become a key technology in microelectronics, optoelectronics and other fields and functional coatings.
